Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/12/2001
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Application #:
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09358769
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Filing Dt:
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07/22/1999
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Inventors:
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TOSHIYA KOTANI, SATOSHI TANAKA, SOICHI INOUE
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Title:
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MASK PATTERN DESIGN METHOD AND A PHOTOMASK
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 72 HORIKAWA-CHO, SAIWAI-KU |
| KAWASAKI-SHI, JAPAN |
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| FINNEGAN, HENDERSON ET AL |
| MR. ERNEST F. CHAPMAN |
| 1300 I STREET N.W. |
| WASHINGTON, D.C. 20005-3315 |
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