Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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08/14/2001
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Application #:
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09615706
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Filing Dt:
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07/13/2000
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Inventors:
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Takashi Ichimori, Norio Hirashita
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Title:
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Method for fabricating a semiconductor device having a metallic silicide layer
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-12, TORANOMON 1-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| JONES VOLENTINE, LLC |
| ADAM C. VOLENTINE |
| 12200 SUNRISE VALLEY DRIVE, SUITE 150 |
| RESTON, CA 20191 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 550-1 HIGASHIASAKAWA-CHO |
| HACHIOJI-SHI, TOKYO, JAPAN 193-8550 |
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| KUBOTERA & ASSOCIATES, LLC |
| 200 DAINGERFIELD ROAD |
| SUITE 202 |
| ALEXANDRIA, VA 22314 |
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