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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
08/28/2001
Application #:
09483875
Filing Dt:
01/18/2000
Inventor:
Hsiao Che Wu
Title:
Apparatus and method to polish a wafer using abrasive flow
Assignment: 1
Reel/Frame:
010518/0472Recorded: 01/18/2000Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
01/04/2000
Assignees:
SCIENCE-BASED INDUSTRIAL PARK
3F, NO. 19, LI HSIN RD.,
HSINCHU, TAIWAN R.O.C
SCIENCE-BASED INDUSTRIAL PARK
NO. 19, LI HSIN RD.
HSINCHU, TAIWAN R.O.C
SCIENCE-BASED INDUSTRIAL PARK
WITTELSBACHERPLATZ 2
MUNCHEN, GERMANY D-803
Correspondent:
DARBY & DARBY P.C.
YA-CHIAO CHANG, ESQ.
805 THIRD AVENUE, 27TH FLOOR
NEW YORK, NY 10022-7513

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