Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/11/2001
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Application #:
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09036219
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Filing Dt:
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03/06/1998
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Inventors:
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KAICHIRO NAKANO, KATSUMI MAEDA, SHIGEYUKI IWASA, ETSUO HASEGAWA
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Title:
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CHEMICALLY AMPLIFIED RESIST LARGE IN TRANSPARENCY AND SENSITIVITY TO EXPOSURE LIGHT LESS THAN 248 NANOMETER WAVELENGTH AND PROCESS OF FORMING MASK
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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7-1, SHIBA 5-CHOME, MINATO-KU |
TOKYO, JAPAN |
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HELFGOTT & KARAS, P.C. |
EMPIRE STATE BUILDING |
60TH FLOOR |
350 5TH AVENUE |
NEW YORK, NEW YORK 10118 |
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