Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/18/2001
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Application #:
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09494592
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Filing Dt:
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01/31/2000
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Inventors:
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Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh
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Title:
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Ionization technique to reduce defects on next generation lithography mask during exposure
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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P.O. BOX 3453 |
ONE AMD PLACE |
SUNNYVALE, CALIFORNIA 94088 |
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AMIN, ESCHWEILER & TUROCY LLP |
GREGORY TUROCY |
24TH FLOOR |
1900 EAST 9TH STREET |
CLEVELAND, OH 44114 |
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