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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
12/25/2001
Application #:
09639122
Filing Dt:
08/16/2000
Inventors:
Eun-ha Lee, Byung-chan Lee, Ho-kyu Kang
Title:
Method of fabricating gate structure of semiconductor device for repairing damage to gate oxide layer
Assignment: 1
Reel/Frame:
011013/0241Recorded: 08/16/2000Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/13/2000
Exec Dt:
07/29/2000
Exec Dt:
07/29/2000
Assignee:
7-12, TORANOMON 1-CHOME, MINATO-KU
TOKYO, JAPAN
Correspondent:
JONES VOLENTINE, LLC
ADAM C. VOLENTINE
12200 SUNRISE VALLEY DRIVE
SUITE 150
RESTON, VA 20191

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