Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
|
Issue Dt:
|
11/12/2002
|
Application #:
|
09630187
|
Filing Dt:
|
08/01/2000
|
|
Inventors:
|
Minoru Matsuda, Hiroshi Maehara, Keita Sakai
|
|
Title:
|
PHOTOSENSITIVE RESIN, RESIST COMPOSITION USING THE PHOTOSENSITIVE RESIN, PATTERN FORMATION METHOD USING THE RESIST COMPOSITION, DEVICE PRODUCED BY THE PATTERN FORMATION METHOD, AND EXPOSURE METHOD
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 30-2, SHIMOMARUKO 3-CHOME, OHTA-KU |
| TOKYO, JAPAN |
|
|
|
|
| FITZPATRICK, CELLA, HARPER & SCINTO |
| ELIZABETH F. HOLOWACZ |
| 30 ROCKEFELLER PLAZA |
| NEW YORK, NEW YORK 10112-3801 |
|
|
Search Results as of:
04/19/2024 07:57 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
