Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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01/07/2003
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Application #:
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09832860
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Filing Dt:
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04/12/2001
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Publication #:
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Pub Dt:
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10/18/2001
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Inventors:
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Norikazu Ito, Yoshimi Watabe, Akihisa Matsuda, Michio Kondo
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Title:
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THIN FILM FORMATION BY INDUCTIVELY - COUPLED PLASMA CVD PROCESS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 3-1, KASUMIGASEKI 1-CHOME |
| CHIYODA-KU, TOKYO, JAPAN |
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| 8-1 YOTSUYA 5-CHOME |
| FUCHU-SHI, TOKYO, JAPAN |
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| 3-2-8 NISHINE-MINAMI |
| TSUCHIURA, IBARAKI, JAPAN |
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| 4-424-104 MATSUSHIRO |
| TSUKUBA, IBARAKI, JAPAN |
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| BURNS, DOANE, SWECKER & MATHIS, L.L.P. |
| PLATON N. MANDROS |
| P.O. BOX 1404 |
| ALEXANDRIA, VIRGINIA 22313-1404 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 2-1, OTEMACHI 2-CHOME |
| CHIYODA-KU, TOKYO, JAPAN |
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| BURNS, DOANE, SWECKER & MATHIS, L.L.P. |
| PLATON N. MANDROS |
| P.O. BOX 1404 |
| ALEXANDRIA, VIRGINIA 22313-1404 |
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