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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
6544429
Issue Dt:
04/08/2003
Application #:
09405869
Filing Dt:
09/24/1999
Inventors:
HOIMAN (RAYMOND) HUNG, JOSEPH P. CAULFIELD, HONGQING SHAN, KENNETH S. COLLINS et al
Title:
ENHANCEMENT OF SILICON OXIDE ETCH RATE AND SUBSTRATE SELECTIVITY WITH XENON ADDITION
Assignment: 1
Reel/Frame:
010504/0945Recorded: 12/20/1999Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
HUNG, HOIMAN
Exec Dt:
12/14/1999
CAULFIELD, JOSEPH P.
Exec Dt:
12/02/1999
SHAN, HONGQING
Exec Dt:
12/13/1999
RICE, MICHAEL
Exec Dt:
12/17/1999
COLLINS, KENNETH S.
Exec Dt:
12/10/1999
CUI, CHUNSHI
Exec Dt:
12/13/1999
Assignee:
APPLIED MATERIALS, INC.
PO BOX 450-A
SANTA CLARA, CALIFORNIA 95052
Correspondent:
APPLIED MATERIALS, INC.
PETER
PO BOX 450-A
SANTA CLARA, CA 95052

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