Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/22/2003
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Application #:
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09526295
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Filing Dt:
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03/15/2000
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Inventors:
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Toshikatsu Minagawa, Eiichi Hoshino, Keiji Watanabe
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Title:
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DEVELOPER AND METHOD FOR FORMING RESIST PATTERN AND PHOTOMASK PRODUCED BY USE THEREOF
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NAKAHARA-KU, KAWASAKI-SHI |
| 1-1, KAMIKODANAKA 4-CHOME |
| KANAGAWA 211-8588, JAPAN |
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| ARMSTRONG, WESTERMAN, HATTORI ET AL. |
| STEPHEN G. ADRIAN |
| 1725 K STREET, NW |
| SUITE 1000 |
| WASHINGTON, DC 20006 |
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