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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
6784119
Issue Dt:
08/31/2004
Application #:
10632179
Filing Dt:
07/31/2003
Publication #:
20040029400
Pub Dt:
02/12/2004
Inventors:
Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Ellie Yieh, Wai-Fan Yau, Shin-Puu Jeng et al
Title:
METHOD OF DECREASING THE K VALUE IN SIOC LAYER DEPOSITED BY CHEMICAL VAPOR DEPOSITION
Assignment: 1
Reel/Frame:
014372/0624Recorded: 07/31/2003Pages: 12
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
GAILLARD, FREDERIC
Exec Dt:
11/15/2000
XIA, LI-QUN
Exec Dt:
11/15/2000
LIM, TIAN-HOE
Exec Dt:
11/16/2000
YIEH, ELLIE
Exec Dt:
11/20/2000
YAU, WAI-FAN
Exec Dt:
12/08/2000
JING, SHIN-PUU
Exec Dt:
12/19/2000
LIU, KUOWEI
Exec Dt:
12/30/2000
LU, YUNG-CHENG
Exec Dt:
11/19/2000
Assignee:
APPLIED MATERIALS, INC.
P.O. BOX 450-A
SANTA CLARA, CALIFORNIA 95052
Correspondent:
APPLIED MATERIALS, INC.
KEITH M. TACKETT
P.O. BOX 450-A
PATENT COUNSEL
SANTA CLARA, CA 95052

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