Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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11/23/2004
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Application #:
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09961798
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Filing Dt:
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09/24/2001
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Publication #:
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Pub Dt:
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08/15/2002
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Inventors:
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Nobuhito Toyama, Naoki Shimohakamada, Wakahiko Sakata
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Title:
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METHOD FOR CORRECTING DESIGN PATTERN OF SEMICONDUCTOR CIRCUIT, A PHOTOMASK FABRICATED USING THE CORRECTED DESIGN PATTERN DATA, A METHOD FOR INSPECTING THE PHOTOMASK AND A METHOD FOR GENERATING PATTERN DATA FOR INSPECTION OF PHOTOMASK
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SHINJUKU-KU |
| 1-1, ICHIGAYA-KAGACHO 1-CHOME |
| TOKYO 162-8001, JAPAN |
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| FLYNN, THIEL, BOUTELL ET AL. |
| DALE H. THIEL |
| 2026 RAMBLING ROAD |
| KALAMAZOO, MI 49008-1699 |
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