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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
11/30/2004
Application #:
10341436
Filing Dt:
01/14/2003
Inventors:
Qi Xiang, Robert B. Ogle, Eric N. Paton, Cyrus E. Tabery, Bin Yu
Title:
POST SILICIDE LASER THERMAL ANNEALING TO AVOID DOPANT DEACTIVATION
Assignment: 1
Reel/Frame:
013667/0570Recorded: 01/14/2003Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
11/21/2002
Exec Dt:
12/13/2002
Exec Dt:
12/13/2002
Exec Dt:
11/15/2002
Exec Dt:
11/21/2002
Assignee:
ONE AMD PLACE
P.O. BOX 3453
SUNNYVALE, CALIFORNIA 94088-3453
Correspondent:
MCDERMOTT, WILL & EMERY
ARTHUR J. STEINER
600 13TH STREET, N.W.
WASHINGTON, DC 20005
Assignment: 2
Reel/Frame:
055767/0934Recorded: 03/30/2021Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
05/05/2020
Assignee:
121 W. LONG LAKE ROAD
SUITE 300
BLOOMFIELD HILLS, MICHIGAN 48304
Correspondent:
SEAN ANDERSON
1526 GILPIN AVENUE
WILMINGTON, DE 19806

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