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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
08/02/2005
Application #:
10225992
Filing Dt:
08/22/2002
Publication #:
Pub Dt:
05/15/2003
Inventors:
Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Jae Hyun Kim, Se Jin Choi, Deog Bae Kim
Title:
PHOTORESIST MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS FOR PREVENTING ACID DIFFUSION
Assignment: 1
Reel/Frame:
013492/0260Recorded: 11/13/2002Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/08/2002
Exec Dt:
08/19/2002
Exec Dt:
08/19/2002
Exec Dt:
08/19/2002
Exec Dt:
08/19/2002
Exec Dt:
08/19/2002
Assignees:
SAN 136-1, AMI-RI, BUBAL-EUB, ICHON-SHI
KYOUNGKI-DO 467-860, KOREA, REPUBLIC OF
472-2 GAJWA-3-DONG, SEO-GU
INCHON-SHI 404-252, KOREA, REPUBLIC OF
Correspondent:
MARSHALL, GERSTEIN & BORUN
MICHAEL R. HULL
233 S. WACKER DRIVE, SUITE 6300
SEARS TOWER
CHICAGO, IL 60606-6357

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