Patent Assignment Abstract of Title
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Total Assignments:
4
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Patent #:
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Issue Dt:
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03/14/2006
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Application #:
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10331641
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Filing Dt:
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12/30/2002
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Publication #:
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Pub Dt:
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07/31/2003
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Inventors:
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Christoph Nolscher, Armin Semmler, Gunther Czech
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Title:
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PHOTOMASK AND METHOD OF STRUCTURING A PHOTORESIST BY DOUBLE EXPOSURE WITH IMAGING AUXILIARY STRUCTURES AND DIFFERENT EXPOSURE TOOLS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| ST.-MARTIN-STRASSE 53 |
| MUENCHEN, GERMANY D-81669 |
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| RALPH E. LOCHER |
| LERNER & GREENBERG P.A. |
| HOLLYWOOD, FLORIDA 33022 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| GUSTAV-HEINEMANN-RING 212 |
| MUNICH, GERMANY 81739 |
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| BARRY E. BRETSCHNEIDER |
| C/O MORRISON AND FOERSTER LLP |
| 1650 TYSONS BLVD. SUITE 400 |
| MCLEAN, VA 22102 |
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Assignment:
3
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| AM CAMPEON 1-12 |
| NEUBIBERG, GERMANY 85579 |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST HELIER, JE1 1BL JERSEY |
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Assignment:
4
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 29 EARLSFORT TERRACE, DUBLIN 2 |
| DUBLIN, IRELAND |
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| POLARIS INNOVATIONS LIMITED |
| 303 TERRY FOX DRIVE, SUITE 300 |
| OTTAWA, K2K 3J1 CANADA |
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