Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/12/2006
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Application #:
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10428688
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Filing Dt:
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05/01/2003
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Publication #:
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Pub Dt:
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11/04/2004
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Inventor:
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Benjamin Szu-Min Lin
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Title:
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EUV REFLECTION MASK AND LITHOGRAPHIC PROCESS USING THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 3, LI-HSIN RD. II |
| SCIENCE-BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN R.O.C. |
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| J. C. PATENTS, INC. |
| JIAWEI HUANG |
| 4 VENTURE, SUITE 250 |
| IRVINE, CA 92618 |
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