Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/19/2006
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Application #:
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10509230
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Filing Dt:
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09/24/2004
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Publication #:
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Pub Dt:
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06/09/2005
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Inventors:
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Shinji Omori, Kaoru Koike, Shigeru Moriya, Isao Ashida
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Title:
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Mask pattern correction method, production method of semicounductor device, mask production method and mask
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-35 KITASHINAGAWA |
| SHINAGAWA-KU, TOKYO, JAPAN 141-0001 |
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| RONALD P. KANANEN |
| RADER, FISHMAN & GRAUER PLLC |
| SON-2628 |
| 1233 20TH STREET, N.W., SUITE 501 |
| WASHINGTON, DC 20036 |
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