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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
02/27/2007
Application #:
10349092
Filing Dt:
01/23/2003
Publication #:
Pub Dt:
08/14/2003
Inventors:
Tomohisa Konno, Masayuki Motonari, Masayuki Hattori, Nobuo Kawahashi
Title:
PROCESS FOR CHEMICAL MECHANICAL POLISHING OF SEMICONDUCTOR SUBSTRATE AND AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING
Assignment: 1
Reel/Frame:
013697/0225Recorded: 01/23/2003Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
11/26/2002
Exec Dt:
11/26/2002
Exec Dt:
11/26/2002
Exec Dt:
11/26/2002
Assignee:
11-24, TSUKIJI 2-CHOME
CHUO-KU, TOKYO 104-8410, JAPAN
Correspondent:
OBLON SPIVAK ET AL
1940 DUKE ST
ALEXANDRIA VA 22314

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