Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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03/04/2008
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Application #:
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10282111
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Filing Dt:
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10/29/2002
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Publication #:
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Pub Dt:
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07/31/2003
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Inventors:
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Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Junichi Kon
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Title:
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RESIST PATTERN THICKNESS REDUCING MATERIAL, RESIST PATTERN AND PROCESS FOR FORMING THEREOF, AND SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING THEREOF
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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1-1 KAMIKODANAKA 4-CHOME, NAKAHARA-KU |
KAWASAKI-SHI |
KANAGAWA, JAPAN 211-8588 |
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ARMSTRONG, WESTERMAN, HATTORI, ET AL. |
STEPHEN G. ADRIAN |
1725 K STREET |
SUITE 1000 |
WASHINGTON, DC 20006 |
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