Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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03/18/2008
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Application #:
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11032021
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Filing Dt:
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01/11/2005
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Publication #:
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Pub Dt:
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07/13/2006
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Inventors:
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Vaidyanathan Balasubramaniam, Yasunori Hatamura, Masaaki Hagihara, Eiichi Nishimura et al
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Title:
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LOW-PRESSURE REMOVAL OF PHOTORESIST AND ETCH RESIDUE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 3-6 AKASAKA 5-CHOME, MINATO-KU |
| TOKYO 107-8481, JAPAN |
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| OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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Assignment:
2
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ASSIGNMENT PREVIOUSLY RECORDED AT REEL: 016493 FRAME: 0610 CONTAINED AN ERROR IN THE ASSIGNEE'S NAME. ASSIGNMENT RE-RECORDED TO CORRECT ERROR ON STATED REEL.
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| 3-6 AKASAKA 5-CHOME |
| MINATO-KU |
| TOKYO 107-8481, JAPAN |
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| OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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Assignment:
3
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CORRECTED FORM PTO-1595 TO CORRECT ASSIGNOR #2'S NAME AND ASSIGNEE'S NAME PREVIOUSLY RECORDED ON REEL/FRAME 017750/0957
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| 3-6 AKASAKA 5-CHOME, MINATO-KU |
| TOKYO 107-8481, JAPAN |
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| C. IRVIN MCCLELLAND |
| OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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