Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/15/2008
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Application #:
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11127036
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Filing Dt:
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05/10/2005
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Publication #:
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Pub Dt:
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11/16/2006
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Inventors:
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Jang Gyoo Yang, Daniel J. Hoffman, Steven C. Shannon, Douglas H. Burns, Wonseok Lee et al
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Title:
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DUAL BIAS FREQUENCY PLASMA REACTOR WITH FEEDBACK CONTROL OF E.S.C. VOLTAGE USING WAFER VOLTAGE MEASUREMENT AT THE BIAS SUPPLY OUTPUT
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 3050 BOWERS AVENUE |
| SANTA CLARA, CALIFORNIA 95052 |
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| APPLIED MATERIALS, INC. |
| P.O. BOX 450A |
| SANTA CLARA,, CA 95052 |
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