Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
|
Issue Dt:
|
05/20/2008
|
Application #:
|
10491165
|
Filing Dt:
|
03/30/2004
|
|
Publication #:
|
|
Pub Dt:
|
11/11/2004
| | | | |
|
Inventors:
|
Masaya Nishiyama, Masanobu Habiro, Hirokazu Hiraoka, Yasuhito Iwatsuki
|
|
Title:
|
POLISHING PAD FOR CMP, METHOD FOR POLISHING SUBSTRATE USING IT AND METHOD FOR PRODUCING POLISHING PAD FOR CMP
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 1-1, NISHISHINJUKU 2-CHOME, SHINJUKU-KU |
| TOKYO, JAPAN 163-0449 |
|
|
|
| 8-7, NIHOMBASHI-HONCHO 2-CHOME, |
| CHUO-KU, TOKYO, JAPAN 103-0023 |
|
|
|
|
| WESTERMAN, HATTORI, DANIELS & ADRIAN, LL |
| 1250 CONNECTICUT AVENUE, NW |
| SUITE 700 |
| WASHINGTON, DC 20036 |
|
|
Search Results as of:
04/28/2024 09:44 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
