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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
05/26/2009
Application #:
10994745
Filing Dt:
11/22/2004
Publication #:
Pub Dt:
05/25/2006
Inventors:
Francis M. Houlihan, Ralph R. Dammel, Andrew R. Romano, Munirathna Padmanaban et al
Title:
PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF
Assignment: 1
Reel/Frame:
017174/0921Recorded: 01/09/2006Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
10/18/2005
Exec Dt:
01/07/2006
Exec Dt:
01/06/2005
Exec Dt:
10/18/2005
Exec Dt:
10/18/2005
Assignee:
70 MEISTER AVENUE
SOMERVILLE, NEW JERSEY 08876
Correspondent:
SANGYA JAIN
AZ ELECTRONIC MATERIALS USA CORP.
70 MEISTER AVENUE
SOMERVILLE, NJ 08876
Assignment: 2
Reel/Frame:
034742/0206Recorded: 01/08/2015Pages: 13
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
12/12/2014
Assignee:
FRANKFURTER STRASSE 250
DARMSTADT, GERMANY 64293
Correspondent:
CPA GLOBAL LIMITED
LIBERATION HOUSE
CASTLE STREET
ST HELIER, JE1 1BL JERSEY

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