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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
03/23/2010
Application #:
11441835
Filing Dt:
05/26/2006
Publication #:
Pub Dt:
12/14/2006
Inventors:
Suk-pil Kim, I-hun Song, Young-Soo Park, Seung-hyuk Chang, Hoon Kim
Title:
REFLECTION MASK FOR EUV PHOTOLITHOGRAPHY AND METHOD OF FABRICATING THE REFLECTION MASK
Assignment: 1
Reel/Frame:
018332/0786Recorded: 08/18/2006Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/11/2006
Exec Dt:
08/11/2006
Exec Dt:
08/11/2006
Exec Dt:
08/11/2006
Exec Dt:
08/11/2006
Assignee:
416, MAETAN-DONG, YEONGTONG-GU
SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Correspondent:
FRANK CHAU, ESQ.
F. CHAU & ASSOCIATES, LLC
130 WOODBURY ROAD
WOODBURY, NY 11797

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