Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/06/2010
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Application #:
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11034958
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Filing Dt:
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01/14/2005
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Publication #:
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Pub Dt:
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08/04/2005
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Inventor:
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Kazuya Fukuhara
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Title:
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EXPOSURE SYSTEM, TEST MASK FOR FLARE TESTING, METHOD FOR EVALUATING LITHOGRAPHY PROCESS, METHOD FOR EVALUATING EXPOSURE TOOLS, METHOD FOR GENERATING CORRECTED MASK PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| ERNEST F. CHAPMAN |
| FINNEGAN, HENDERSON, FARABOW, GARRETT |
| & DUNNER, L.L.P. |
| 901 NEW YORK AVENUE, NW |
| WASHINGTON, D.C. 20001-4413 |
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