Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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04/13/2010
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Application #:
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12010793
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Filing Dt:
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01/30/2008
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Publication #:
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Pub Dt:
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09/11/2008
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Inventors:
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Tatsuo Kasaoka, Kiyohiko Sakakibara, Noboru Mori, Kazunobu Miki
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Title:
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE THAT USES BOTH A NORMAL PHOTOMASK AND A PHASE SHIFT MASK FOR DEFINING INTERCONNECT PATTERNS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 6-2, OTEMACHI 2-CHOME |
| CHIYODA-KU |
| TOKYO 100-0004, JAPAN |
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| MCDERMOTT WILL & EMERY LLP |
| 600 13TH STREET, N.W. |
| WASHINGTON, D.C. 20005-3096 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 1753, SHIMONUMABE, NAKAHARA-KU, KAWASAKI-SHI, |
| KANAGAWA, JAPAN 211-8668 |
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| MCDERMOTT WILL & EMERY LLP |
| 600 THIRTEENTH STREET, N.W. |
| WASHINGTON, DC 20005-3096 |
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