Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/05/2010
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Application #:
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10588866
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Filing Dt:
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08/09/2006
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Publication #:
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Pub Dt:
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07/26/2007
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Inventors:
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Toshiyuki Ogata, Syogo Matsumaru, Hideo Hada
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Title:
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POLYMER COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE POLYMER COMPOUND, AND RESIST PATTERN FORMATION METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150 NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA-KEN, JAPAN |
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| KNOBBE, MARTENS, OLSON & BEAR, LLP |
| 2040 MAIN STREET, 14TH FLOOR |
| IRVINE, CALIFORNIA 92614 |
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