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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
10/19/2010
Application #:
11338462
Filing Dt:
01/24/2006
Publication #:
Pub Dt:
08/10/2006
Inventors:
David J. Abdallah, Mark O. Neisser, Ralph R. Dammel, Georg Pawlowski, John Biafore et al
Title:
PROCESS OF IMAGING A PHOTORESIST WITH MULTIPLE ANTIREFLECTIVE COATINGS
Assignment: 1
Reel/Frame:
017454/0717Recorded: 04/07/2006Pages: 4
Conveyance:
CORRECTED COVER SHEET TO CORRECT APPLICATION NUMBER FROM 11/338,482 TO 11/338,462 PREVIOUSLY RECORDED AT REEL/FRAME 017412/0471 (ASSIGNMENT OF ASSIGNOR'S INTEREST)
Assignors:
Exec Dt:
01/19/2006
Exec Dt:
01/19/2006
Exec Dt:
01/18/2006
Exec Dt:
01/18/2006
Exec Dt:
01/20/2006
Exec Dt:
01/19/2006
Exec Dt:
01/19/2006
Assignee:
70 MEISTER AVENUE
SOMERVILLE, NEW JERSEY 08876
Correspondent:
SANGYA JAIN
AZ ELECTRONIC MATERIALS USA CORP.
70 MEISTER AVENUE
SOMERVILLE, NJ 08876

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