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Patent Assignment Abstract of Title
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Total Assignments: 4
Patent #:
7838482
Issue Dt:
11/23/2010
Application #:
10544073
Filing Dt:
07/29/2005
Publication #:
20060148667
Pub Dt:
07/06/2006
Inventors:
Masato Fukasawa, Masato Yoshida, Kouji Haga, Yasushi Kurata, Kazuhiro Enomoto et al
Title:
CMP POLISHING COMPOUND AND POLISHING METHOD
Assignment: 1
Reel/Frame:
017566/0744Recorded: 07/29/2005Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
FUKASAWA, MASATO
Exec Dt:
07/21/2005
YOSHIDA, MASATO
Exec Dt:
07/21/2005
KOYAMA, NAOYUKI
Exec Dt:
07/21/2005
OOTSUKI, YUTO
Exec Dt:
07/21/2005
YAMAGISHI, CHIAKI
Exec Dt:
07/21/2005
ENOMOTO, KAZUHIRO
Exec Dt:
07/21/2005
HAGA, KOUJI
Exec Dt:
07/21/2005
KURATA, YASUSHI
Exec Dt:
07/21/2005
Assignee:
HITACHI CHEMICAL CO., LTD.
1-1, NISHISHINJUKU 2-CHOME, SHINJUKU-KU
TOKYO, JAPAN 163-0449
Correspondent:
WESTERMAN, HATTORI, DANIELS, ET AL.
1250 CONNECTICUT AVENUE, N.W.
SUITE 700
WASHINGTON, D.C. 20036
Assignment: 2
Reel/Frame:
062917/0865Recorded: 03/02/2023Pages: 21
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
HITACHI CHEMICAL COMPANY, LTD.
Exec Dt:
10/01/2020
Assignee:
SHOWA DENKO MATERIALS CO., LTD.
9-2, MARUNOUCHI 1-CHOME
TOKYO, JAPAN 100-6606
Correspondent:
ALAN E. SCHIAVELLI
700 12TH STREET NW, SUITE 700
WASHINGTON, DC 20005
Assignment: 3
Reel/Frame:
062946/0125Recorded: 03/03/2023Pages: 21
Conveyance:
CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Assignor:
SHOWA DENKO MATERIALS CO., LTD.
Exec Dt:
01/01/2023
Assignee:
RESONAC CORPORATION
13-9, SHIBA DAIMON 1-CHOME, MINATO-KU
TOKYO, JAPAN 105-8518
Correspondent:
ALAN E. SCHIAVELLI
700 12TH STREET NW, SUITE 700
WASHINGTON, DC 20005
Assignment: 4
Reel/Frame:
066599/0037Recorded: 02/14/2024Pages: 40
Conveyance:
CHANGE OF ADDRESS
Assignor:
RESONAC CORPORATION
Exec Dt:
10/01/2023
Assignee:
RESONAC CORPORATION
9-1, HIGASHI-SHIMBASHI 1-CHOME
MINATO-KU
TOKYO, JAPAN 105-7325
Correspondent:
ALAN E. SCHIAVELLI
SUITE 2100
120 SOUTH LASALLE STREET
CHICAGO, IL 60603

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