Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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12/07/2010
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Application #:
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11587509
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Filing Dt:
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07/23/2007
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Publication #:
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Pub Dt:
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02/07/2008
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Inventors:
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Keita Ishizuka, Kazumasa Wakiya, Masaaki Yoshida, Kotaro Endo
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Title:
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MATERIAL FOR FORMING RESIST PROTECTIVE FILM FOR USE IN LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING THE PROTECTIVE FILM
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
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| DANIEL A. SCOLA, JR. |
| HOFFMANN & BARON, LLP |
| 6900 JERICHO TURNPIKE |
| SYOSSET, NY 11791 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
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| DANIEL A. SCOLA, JR. |
| HOFFMANN & BARON,LLP |
| 6900 JERICHO TURNPIKE |
| SYOSSET, NY 11791 |
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