Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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12/21/2010
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Application #:
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12353284
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Filing Dt:
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01/14/2009
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Publication #:
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Pub Dt:
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05/21/2009
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Inventors:
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Kazuyuki Hayashi, Takashi Sugiyama
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Title:
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SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 12-1, YURAKUCHO 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| OBLON, SPIVAK, ET AL. |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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