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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
03/15/2011
Application #:
12205967
Filing Dt:
09/08/2008
Publication #:
Pub Dt:
01/08/2009
Inventors:
Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami
Title:
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
Assignment: 1
Reel/Frame:
021494/0109Recorded: 09/08/2008Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
06/11/2008
Exec Dt:
06/24/2008
Exec Dt:
06/27/2008
Exec Dt:
06/18/2008
Assignee:
12-1, YURAKUCHO 1-CHOME, CHIYODA-KU
TOKYO, JAPAN 100-8405
Correspondent:
OBLON, SPIVAK
1940 DUKE STREET
ALEXANDRIA, VA 22314

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