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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
05/10/2011
Application #:
11730454
Filing Dt:
04/02/2007
Publication #:
Pub Dt:
10/04/2007
Inventors:
Hak-seung Han, Seong-woon Choi, Byung-gook Kim, Hee-bom Kim, Sung-ho Park
Title:
PHOTOMASK USING SEPARATED EXPOSURE TECHNIQUE, METHOD OF FABRICATING PHOTOMASK, AND APPARATUS FOR FABRICATING PHOTOMASK BY USING THE METHOD
Assignment: 1
Reel/Frame:
019186/0032Recorded: 04/02/2007Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
03/15/2007
Exec Dt:
03/28/2007
Exec Dt:
03/19/2007
Exec Dt:
03/19/2007
Exec Dt:
03/21/2007
Assignee:
416 MAETAN-DONG, YEONGTONG-GU
SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Correspondent:
EUGENE M. LEE
LEE & MORSE, PC
3141 FAIRVIEW PARK DRIVE
SUITE 500
FALLS CHURCH, VA 22042

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