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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
06/28/2011
Application #:
12329189
Filing Dt:
12/05/2008
Publication #:
Pub Dt:
07/09/2009
Inventors:
Seok Han, Young-Hoon Kim, Hyo-Sun Kim
Title:
METHOD OF FORMING A PATTERN USING A PHOTORESIST COMPOSITION FOR IMMERSION LITHOGRAPHY
Assignment: 1
Reel/Frame:
022461/0109Recorded: 03/27/2009Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
03/26/2009
Exec Dt:
03/26/2009
Exec Dt:
03/26/2009
Assignee:
416 MAETAN-DONG
YEONGTONG-GU, SUWON-SI
GYEONGGI-DO, KOREA, REPUBLIC OF
Correspondent:
MYERS BIGEL SIBLEY & SAJOVEC
PO BOX 37428
RALEIGH, NC 27627

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