Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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08/16/2011
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Application #:
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12223310
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Filing Dt:
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07/25/2008
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Publication #:
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Pub Dt:
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09/16/2010
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Inventors:
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Go Noya, Masakazu Kobayashi, Ryuta Shimazaki
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Title:
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PROCESSING LIQUID FOR RESIST SUBSTRATE AND METHOD OF PROCESSING RESIST SUBSTRATE USING THE SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 70 MEISTER AVENUE |
| SOMERVILLE, NEW JERSEY 08876 |
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| SANGYA JAIN |
| AZ ELECTRONIC MATERIALS USA CORP. |
| 70 MEISTER AVENUE |
| SOMERVILLE, NJ 08876 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 70 MEISTER AVENUE |
| SOMERVILLE, NEW JERSEY USA 08876 |
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| SANGYA JAIN |
| AZ ELECTRONIC MATERIALS USA CORP. |
| 70 MEISTER AVENUE |
| SOMERVILLE, NJ US 08876 |
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Assignment:
3
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| FRANKFURTER STRASSE 250 |
| DARMSTADT, GERMANY 64293 |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST HELIER, JE1 1BL JERSEY |
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