Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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03/12/2013
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Application #:
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12232757
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Filing Dt:
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09/23/2008
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Publication #:
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Pub Dt:
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02/12/2009
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Inventors:
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Tadashi Matsuo, Koichiro Kanayama, Shinpei Tamura
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Title:
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REFLECTION TYPE PHOTOMASK BLANK, MANUFACTURING METHOD THEREOF, REFLECTION TYPE PHOTOMASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-1, TAITO 1-CHOME |
| TAITO-KU, TOKYO, JAPAN |
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| STAAS & HALSEY LLP |
| ATTENTION: DAVID M. PITCHER |
| 1201 NEW YORK AVE., N.W., SUITE 700 |
| WASHINGTON, D.C. 20005 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 5-1, TAITO 1-CHOME, TAITO-KU |
| TOKYO, JAPAN |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST. HELIER, JI1 1BL JERSEY |
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Assignment:
3
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| 3-19-26, SHIBAURA, MINATO-KU |
| TOKYO, JAPAN |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST. HELIER, JI1 1BL JERSEY |
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