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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
08/06/2013
Application #:
13005536
Filing Dt:
01/13/2011
Publication #:
Pub Dt:
05/05/2011
Inventors:
Yusuke ANNO, Kouichi Fujiwara, Makoto Sugiura, Gouji Wakamatsu
Title:
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD
Assignment: 1
Reel/Frame:
025628/0298Recorded: 01/13/2011Pages: 10
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
12/17/2010
Exec Dt:
12/17/2010
Exec Dt:
12/28/2010
Exec Dt:
12/20/2010
Assignee:
1-9-2, HIGASHI-SHINBASHI, MINATO-KU
TOKYO, JAPAN 105-8640
Correspondent:
MASAYASU MORI
918 PRINCE STREET
ALEXANDRIA, VA 22314

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