Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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08/20/2013
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Application #:
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13266791
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Filing Dt:
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10/28/2011
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Publication #:
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Pub Dt:
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01/17/2013
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Inventors:
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Ru Huang, Jing Zhuge, Jiewen Fan, Yujie Ai, Runsheng Wang, Xin Huang
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Title:
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FABRICATION METHOD FOR SURROUNDING GATE SILICON NANOWIRE TRANSISTOR WITH AIR AS SPACERS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| NO. 5 YIHEYUAN ROAD |
| HAIDIAN DISTRICT |
| BEIJING, CHINA 100871 |
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| JOSEPH V. COLAIANNI |
| 2550 M STREET NW |
| PATTON BOGGS |
| WASHINGTON, DC 20037 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 18 ZHANGJIANG ROAD, PUDONG NEW AREA, |
| SHANGHAI, CHINA 201203 |
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| NO.5 YIHEYUAN ROAD, HAIDIAN DISTRICT |
| BEIJING, CHINA 100871 |
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| ANOVA LAW GROUP, PLLC |
| 21351 GENTRY DRIVE, SUITE 150 |
| STERLING, VA 20166 |
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