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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
12/03/2013
Application #:
12742381
Filing Dt:
08/24/2010
Publication #:
Pub Dt:
12/09/2010
Inventors:
Yoshiaki Takaya, Takuro Satsuka, Yoshihisa Hayashida, Anupam Mitra, Takahisa Kusuura
Title:
ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE
Assignment: 1
Reel/Frame:
024728/0508Recorded: 07/22/2010Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
04/19/2010
Exec Dt:
04/19/2010
Exec Dt:
04/19/2010
Exec Dt:
04/19/2010
Exec Dt:
05/06/2010
Assignee:
25-10, HATCHOBORI 2-CHOME, CHUO-KU
TOKYO, JAPAN 1048502
Correspondent:
FACTOR & LAKE, LTD.
1327 W. WASHINGTON BLVD., SUITE 5G/H
CHICAGO, IL 60607
Assignment: 2
Reel/Frame:
031014/0171Recorded: 08/14/2013Pages: 2
Conveyance:
CHANGE OF ADDRESS OF ASSIGNEE
Assignor:
Exec Dt:
08/14/2013
Assignee:
1-1, IRIFUNE 2-CHOME
CHUO-KU
TOKYO, JAPAN 104-8502
Correspondent:
FACTOR INTELLECTUAL PROPERTY LAW GROUP,
1327 W. WASHINGTON BLVD.
SUITE 5G/H
CHICAGO, IL 60607

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