Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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02/23/2016
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Application #:
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14669996
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Filing Dt:
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03/26/2015
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Publication #:
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Pub Dt:
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07/16/2015
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Inventor:
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Yoshiaki IKUTA
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD OF MANUFACTURING THEREOF, REFLECTIVE MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THEREOF
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| OBLON, ET AL. |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, |
| TOKYO, JAPAN 100-8405 |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE STREET |
| ST HELIER, JE1 1BL JERSEY |
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