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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
9316910
Issue Dt:
04/19/2016
Application #:
13406306
Filing Dt:
02/27/2012
Publication #:
20120219913
Pub Dt:
08/30/2012
Inventors:
Hidenori TAKAHASHI, Shoichi SAITOH, Fumihiro YOSHINO, Shohei KATAOKA, Shuhei YAMAGUCHI et al
Title:
PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM
Assignment: 1
Reel/Frame:
027776/0522Recorded: 02/28/2012Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
KATAOKA, SHOHEI
Exec Dt:
02/13/2012
TAKAHASHI, HIDENORI
Exec Dt:
02/13/2012
YAMAGUCHI, SHUHEI
Exec Dt:
02/13/2012
SAITOH, SHOICHI
Exec Dt:
02/13/2012
SHIRAKAWA, MICHIHIRO
Exec Dt:
02/13/2012
YOSHINO, FUMIHIRO
Exec Dt:
02/13/2012
Assignee:
FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME
MINATO-KU, TOKYO, JAPAN 106-8620
Correspondent:
SUGHRUE MION, PLLC
2100 PENNSYLVANIA AVENUE NW, SUITE 800
WASHINGTON, DC 20037

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