Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/18/2017
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Application #:
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13943062
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Filing Dt:
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07/16/2013
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Publication #:
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Pub Dt:
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11/14/2013
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Inventors:
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Tomotaka TSUCHIMURA, Tadateru YATSUO
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Title:
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CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| SUGHRUE MION, PLLC |
| 2100 PENNSYLVANIA AVE. NW |
| SUITE 800 |
| WASHINGTON, DC 20037-3213 |
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