Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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01/23/2018
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Application #:
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14912831
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Filing Dt:
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02/18/2016
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Publication #:
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Pub Dt:
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07/07/2016
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Inventors:
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Youichi MIURA, Katsuya HAYANO, Hiroshi WATANABE, Takashi ADACHI, Hideyoshi TAKAMIZAWA et al
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Title:
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MASK BLANK, MASK BLANK WITH NEGATIVE RESIST FILM, PHASE SHIFT MASK, AND METHOD FOR PRODUCING PATTERN FORMED BODY USING SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, ICHIGAYA-KAGACHO 1-CHOME, SHINJUKU-KU |
| TOKYO, JAPAN 162-8001 |
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| HAMRE, SCHUMANN, MUELLER & LARSON, P.C. |
| P.O. BOX 2902 |
| MINNEAPOLIS, MN 55402-0902 |
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