Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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05/22/2018
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Application #:
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14897342
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Filing Dt:
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12/10/2015
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Publication #:
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Pub Dt:
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04/28/2016
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Inventors:
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Tadaaki Kaneko, Noboru Ohtani, Kenta Hagiwara
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Title:
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A METHOD FOR TREATING THE SURFACE OF A SILICON-CARBIDE SUBSTRATE INCLUDING A REMOVAL STEP IN WHICH A MODIFIED LAYER PRODUCED BY POLISHING IS REMOVED BY HEATING UNDER SI VAPOR PRESSURE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-155, UEGAHARA-ICHIBAN-CHO |
| NISHINOMIYA-SHI, HYOGO, JAPAN 662-8501 |
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| WESTERMAN, HATTORI, DANIELS&ADRIAN, LLP. |
| 1250 CONNECTICUT AVE. NW |
| SUITE 700 |
| WASHINGTON, DC 20036 |
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