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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
NONE
Issue Dt:
Application #:
09752395
Filing Dt:
12/28/2000
Publication #:
Pub Dt:
08/16/2001
Inventors:
Dietmar Schmitz, Johannes Kaeppeler, Gert Strauch, Michael Heuken, Holger Jurgensen
Title:
Method for producing a wafer support, used, in particular, in a high-temperature CVD reactor or in a high-temperature CVD process which involves the use of aggressive gases
Assignment: 1
Reel/Frame:
011651/0647Recorded: 03/26/2001Pages: 6
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
12/21/2000
Exec Dt:
12/21/2000
Exec Dt:
12/21/2000
Exec Dt:
12/19/2000
Exec Dt:
12/21/2000
Assignee:
KACKERTSSTRASSE15-17
D-52072 AACHEN, GERMANY
Correspondent:
ST. ONGE STEWARD JOHNSTON & REENS LLC
WESLEY W. WHITMYER, JR
986 BEDFORD STREET
STAMFORD, CT 06905-5619

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