Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10098173
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Filing Dt:
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03/15/2002
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Publication #:
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Pub Dt:
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11/28/2002
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Inventors:
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Nobunori Abe, Kakuei Ozawa
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Title:
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Substrate for forming a resist pattern, process for producing the substrate and process for forming a resist pattern of the chemical amplification type
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 6-1, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8 |
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| ARMSTRONG, WESTERMAN & HATTORI, LLP |
| STEPHEN G. ADRIAN |
| 1725 K STREET, N.W., SUITE 1000 |
| WASHINGTON, D.C. 20006 |
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| ARMSTRONG, WESTERMAN & HATTORI, LLP |
| SUITE 1000, 1725 K STREET |
| WASHINGTON, D.C. 20006 |
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