Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10024958
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Filing Dt:
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12/18/2001
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Publication #:
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Pub Dt:
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01/02/2003
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Inventors:
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Melisa Buie, Brigitte Stoehr, Guenther Ruhl
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Title:
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Etch process for photolithographic reticle manufacturing with improved etch bias
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| A CORPORATE OF THE STATE OF DELAWARE, M/S 2061 |
| 3050 BOWERS AVE. |
| SANTA CLARA, CALIFORNIA 95054 |
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| A CORPORATION OF THE COUNTRY OF GERMANY |
| ST. -MARTIN-STR. 53 |
| MUNCHEN, GERMANY 81669 |
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| APPLIED MATERIALS, INC |
| ROBERT W. MULCAHY |
| P.O. BOX 450-A |
| PATENT COUNSEL, M/S 2061 |
| SANTA CLARA, CA 95052 |
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