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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
09/07/2004
Application #:
10165324
Filing Dt:
06/10/2002
Publication #:
Pub Dt:
01/09/2003
Inventors:
Eiji Hayashi, Atsushi Shiota, Kinji Yamada, Michinori Nishikawa
Title:
METHOD FOR THE FORMATION OF SILICA FILM, SILICA FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE
Assignment: 1
Reel/Frame:
013119/0759Recorded: 07/23/2002Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
06/03/2002
Exec Dt:
06/03/2002
Exec Dt:
06/03/2002
Exec Dt:
06/03/2002
Assignee:
11-24, TSUKIJI 2-CHOME, CHUO-KU
TOKYO, JAPAN
Correspondent:
OBLON, SPIVAK, MCCLELLAND, ET AL.
NORMAN F. OBLON
1755 JEFFERSON DAVIS HIGHWAY
FOURTH FLOOR
ARLINGTON, VA 22202

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