Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10020047
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Filing Dt:
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12/07/2001
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Publication #:
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Pub Dt:
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03/06/2003
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Inventors:
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Mordechai Rothschild, Vladimir Liberman
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Title:
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Attenuating phase shift mask for photolithography
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| ROOM NE25-230 |
| 5 CAMBRIDGE CENTER, KENDALL SQUARE |
| CAMBRIDGE, MASSACHUSETTS 02142 |
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| WOLF, GREENFIELD & SACKS, P.C. |
| JEFFREY B. POWERS |
| FEDERAL RESERVE PLAZA |
| 600 ATLANTIC AVENUE |
| BOSTON, MA 02110 |
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Assignment:
2
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CONFIRMATORY LICENSE (SEE DOCUMENT FOR DETAILS).
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| ESC/JAZ |
| 40 WRIGHT STREET, BLDG 1120 |
| HANSCOM AFB, MASSACHUSETTS 01731 |
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| CATHERINE A. SCHULZ |
| ESC/JAZ |
| 40 WRIGHT STREET, BLDG 1120 |
| HANSCOM AFB, MA 01731-2903 |
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