Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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09941537
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Filing Dt:
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08/29/2001
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Publication #:
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Pub Dt:
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03/06/2003
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Inventors:
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Jong Chen, Shyue Sheng Lu, Jyu Horng Shieh
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Title:
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Method for reducing light reflectance in a photolithographic dual damascene trench patterning process
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SCIENCE-BASED INDUSTRIAL PARK |
| NO. 121 PARK AVENUE 3 |
| HSIN-CHU, TAIWAN R.O.C |
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| TUNG & ASSOCIATES |
| RANDY W. TUNG |
| 838 W. LONG LAKE ROAD |
| SUITE 120 |
| BLOOMFIELD HILLS, MICHIGAN 48302 |
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